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dc.date.accessioned2021-04-19T20:19:05Z
dc.date.available2021-08-20T22:45:53Z
dc.date.created2020-11-29T16:17:06Z
dc.date.issued2020
dc.identifier.citationKvalvik, Julie Nitsche Hansen, Per-Anders Stensby Nilsen, Ola . Design of experiments approach to luminescent CaMoO4 by atomic layer deposition. Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films. 2020, 38, 052408
dc.identifier.urihttp://hdl.handle.net/10852/85362
dc.description.abstractAtomic layer deposition (ALD) is evolving beyond binary compounds to complex oxides and doped structures, taking advantage of the nanometer precision ALD provides. In practice, the development of complex ALD-processes usually means performing many ALD-runs, as success at first attempt is unlikely. One factor at a time methods, where only one factor is altered and the rest are kept constant, are most often chosen due to their intuitive communication of control. However, they do have several drawbacks, being slow, neglecting secondary effects, and are usually not randomized—meaning that errors that arise over time can easily be overlooked. We here dig into our statistical toolbox and show how design of experiments (DoE) can be used to efficiently develop an ALD-process to deposit crystalline, luminescent CaMoO4—a proposed material for optoelectronic applications, like light emitting diodes or as a host for solar down-converters. Using DoE enables screening for a wider range of deposition temperatures, pulsed composition, and annealing parameters, by only performing nine ALD-runs in our case. We moreover look into how these parameters affect crystallinity, composition, and the photoluminescence properties and use DoE to show which factors have the greatest effects on these properties. The work also lays out the basic theory of the DoE-field and how to implement DoE in developing ALD-processes, in general, to ease the usage of DoE for the ALD-community.
dc.languageEN
dc.titleDesign of experiments approach to luminescent CaMoO4 by atomic layer deposition
dc.typeJournal article
dc.creator.authorKvalvik, Julie Nitsche
dc.creator.authorHansen, Per-Anders Stensby
dc.creator.authorNilsen, Ola
cristin.unitcode185,15,12,0
cristin.unitnameKjemisk institutt
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.fulltextpostprint
cristin.qualitycode1
dc.identifier.cristin1853787
dc.identifier.bibliographiccitationinfo:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films&rft.volume=38&rft.spage=052408&rft.date=2020
dc.identifier.jtitleJournal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films
dc.identifier.volume38
dc.identifier.issue5
dc.identifier.doihttps://doi.org/10.1116/6.0000327
dc.identifier.urnURN:NBN:no-88004
dc.type.documentTidsskriftartikkel
dc.type.peerreviewedPeer reviewed
dc.source.issn0734-2101
dc.identifier.fulltextFulltext https://www.duo.uio.no/bitstream/handle/10852/85362/1/6.0000327.pdf
dc.type.versionPublishedVersion
cristin.articleid052408
dc.relation.projectNFR/244087


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