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dc.date.accessioned2017-08-16T14:07:38Z
dc.date.available2017-08-16T14:07:38Z
dc.date.created2011-09-15T14:46:07Z
dc.date.issued2011
dc.identifier.citationAzarov, Alexander Hallén, Anders Du, Xiaolong Liu, Z. L. Svensson, Bengt Gunnar Kuznetsov, Andrej . Thermally induced surface instability in ion-implanted MgxZn1−xO films. Physical Review B. Condensed Matter and Materials Physics. 2011, 84
dc.identifier.urihttp://hdl.handle.net/10852/57106
dc.description.abstractThermal stability of originally single crystalline wurtzite MgxZn1−xO (x ⩽ 0.3) films implanted at room temperature with 166Er ions is studied by a combination of Rutherford backscattering spectrometry, time-of-flight elastic recoil detection analysis, x-ray diffraction analysis, and atomic force microscopy. The MgZnO films exhibit a complex behavior during postimplantation annealing associated with compositional changes and surface erosion in addition to Er accumulation at the surface. The importance of these processes depends on the Mg content, annealing temperature, and amount of implantation damage. Specifically, increases in the Mg content as well as the implantation damage enhance the compositional changes in the near-surface region and give rise to altered stoichiometry and Mg-enriched phase separation. In its turn, the rate of surface erosion in MgZnO under the thermal treatment depends on temperature, MgZnO composition, and the amount of implantation damage nontrivially, which is attributed to the compositional changes in the near-surface region assisted by the implantation damage. © 2011 American Physical Societyen_US
dc.languageEN
dc.publisherAmerican Physical Society
dc.titleThermally induced surface instability in ion-implanted MgxZn1−xO filmsen_US
dc.typeJournal articleen_US
dc.creator.authorAzarov, Alexander
dc.creator.authorHallén, Anders
dc.creator.authorDu, Xiaolong
dc.creator.authorLiu, Z. L.
dc.creator.authorSvensson, Bengt Gunnar
dc.creator.authorKuznetsov, Andrej
cristin.unitcode185,15,17,0
cristin.unitnameSenter for materialvitenskap og nanoteknologi
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode2
dc.identifier.cristin839780
dc.identifier.bibliographiccitationinfo:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Physical Review B. Condensed Matter and Materials Physics&rft.volume=84&rft.spage=&rft.date=2011
dc.identifier.jtitlePhysical Review B. Condensed Matter and Materials Physics
dc.identifier.volume84
dc.identifier.doihttp://dx.doi.org/10.1103/PhysRevB.84.014114
dc.identifier.urnURN:NBN:no-59829
dc.type.documentTidsskriftartikkelen_US
dc.type.peerreviewedPeer reviewed
dc.source.issn1098-0121
dc.identifier.fulltextFulltext https://www.duo.uio.no/bitstream/handle/10852/57106/1/PhysRevB.84.014114.pdf
dc.type.versionPublishedVersion


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