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(Journal article / Tidsskriftartikkel / Published version; Peer reviewed, 2013)
The ferroelectric and electro-optical properties of LiNbO3 make it an important material for current and future applications. It has also been suggested as a possible lead-free replacement for present PZT-devices. The ...
(Journal article / Tidsskriftartikkel / AcceptedVersion; Peer reviewed, 2013)
Ln2O3 thin films with optically active f-electrons (Ln = Pr, Nd, Sm, Eu, Tb, Dy, Ho, Er, Tm, Yb) have been grown on Si(100) and soda lime glass substrates by atomic layer deposition (ALD) using Ln(thd)3 (Hthd = ...
(Journal article / Tidsskriftartikkel / PublishedVersion; Peer reviewed, 2014)
Luminescent europium titanium oxides (EuxTiyOz) have been deposited as thin films by atomic layer deposition (ALD) in the temperature range 225 to 375 °C with control of the stoichiometry from pure TiO2 to pure Eu2O3, and ...
(Journal article / Tidsskriftartikkel / PublishedVersion; Peer reviewed, 2019)
Potassium sodium niobate (KNN) has long been considered a viable candidate for replacing lead‐based materials in piezo‐ and ferroelectric devices. The introduction of KNN on an industrial scale is highly awaited; however, ...
(Journal article / Tidsskriftartikkel / PublishedVersion; Peer reviewed, 2019)
The authors here report epitaxial growth of the ferrimagnet NixFe3–xO4 (NFO) by atomic layer deposition at low temperatures. Films grow epitaxially at a reactor temperature of 250 °C and require no further postannealing ...
(Journal article / Tidsskriftartikkel / PublishedVersion; Peer reviewed, 2021)
Monolithic device integration of crystalline complex oxide thin films can open for smarter and more sustainable devices in electronics and energy technology. However, the facile integration of such compounds has so far ...
(Journal article / Tidsskriftartikkel / PublishedVersion; Peer reviewed, 2016)
Thin films of complex alkali oxides are frequently investigated due to the large range of electric effects that are found in this class of materials. Their piezo- and ferroelectric properties also place them as sustainable ...
(Journal article / Tidsskriftartikkel / PublishedVersion; Peer reviewed, 2014)
Thin films of sodium and potassium oxides have for the first time been deposited using atomic layer deposition. Sodium and potassium complexes of tert-butanol, trimethylsilanol and hexamethyldisilazide have been evaluated ...
(Journal article / Tidsskriftartikkel / AcceptedVersion; Peer reviewed, 2017)
UV to visible and near-infrared converting thin films of YbVO4 have been deposited by atomic layer deposition, using the precursor combinations Yb(thd)3 (thd = 2,2,6,6-tetramethyl-3,5-heptanedione) and O3, and VO(thd)2 and ...
(Journal article / Tidsskriftartikkel / AcceptedVersion; Peer reviewed, 2018)
Thin film of silicon is an interesting material for many technological applications in electronic industry and in energy harvesting technologies, but requires a method for controlled growth of thin films. The purpose of ...