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Atomic layer deposition of (K,Na)(Nb,Ta)O3 thin films

Sønsteby, Henrik Hovde; Nilsen, Ola; Fjellvåg, Helmer
Journal article; PublishedVersion; Peer reviewed
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1-4953406.pdf (1.189Mb)
Year
2016
Permanent link
http://urn.nb.no/URN:NBN:no-58215

CRIStin
1368546

Is part of
Sønsteby, Henrik Hovde (2017) Piezo- and Ferroelectric A+B5+O3 Thin Films. Doctoral thesis.
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  • Kjemisk institutt [843]
Original version
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 2016, 34:041508, DOI: http://dx.doi.org/10.1116/1.4953406
Abstract
Thin films of complex alkali oxides are frequently investigated due to the large range of electric effects that are found in this class of materials. Their piezo- and ferroelectric properties also place them as sustainable lead free alternatives in optoelectronic devices. Fully gas-based routes for deposition of such compounds are required for integration into microelectronic devices that need conformal thin films with high control of thickness- and composition. The authors here present a route for deposition of materials in the (K,Na)(Nb,Ta)O3-system, including the four end members NaNbO3, KNbO3, NaTaO3, and KTaO3, using atomic layer deposition with emphasis on control of stoichiometry in such mixed quaternary and quinary compunds.
 
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