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dc.date.accessioned2020-03-10T20:42:25Z
dc.date.available2021-02-09T23:45:51Z
dc.date.created2019-06-10T23:30:10Z
dc.date.issued2019
dc.identifier.citationMikheenko, Pavlo . Excitation of Vortex-Antivortex Pairs in Thin Superconducting Films and Superlattices. Advances in Thin Films, Nanostructured Materials, and Coatings. 2019, 277-285. Singapore: Springer
dc.identifier.urihttp://hdl.handle.net/10852/73899
dc.description.abstractDirect imaging of the accumulation of magnetic flux and antiflux resulted from the excitation of vortex-antivortex pairs inside thin superconducting films is reported. Thin-film superconductors, like YBa2Cu3O7/PrBa2Cu3O7 superlattices or NbN films grown by pulsed laser deposition, were used in experiments. The superlattices provide enhanced pinning for vortices, facilitating imaging of accumulated flux, and feature nanoscale fractures ideal for excitation of vortex-antivortex pairs. The idea of the experiment is to record images using a specific magneto-optical mode that allows distinguishing between positive and negative magnetic field in the sample. Two types of flux-antiflux patterns are observed. In one type, flux and antiflux are entering on permanent defects, like nano-fractures formed in the process of film deposition. In another type, flux and antiflux patterns are formed by application of a strong localized magnetic field and not are linked to permanent defects. In the first type, the amount of flux and antiflux entering superconductor from the defect is strongly affected by an external magnetic field. In the second type, the permanently frozen pattern is hardly influenced by the field. An unusual and dramatic effect of the excitation of flux-antiflux dendritic avalanches is also reported.en_US
dc.languageEN
dc.publisherSpringer
dc.titleExcitation of Vortex-Antivortex Pairs in Thin Superconducting Films and Superlatticesen_US
dc.typeChapteren_US
dc.creator.authorMikheenko, Pavlo
cristin.unitcode185,15,4,10
cristin.unitnameKondenserte fasers fysikk
cristin.ispublishedtrue
cristin.fulltextpostprint
dc.identifier.cristin1779239
dc.identifier.bibliographiccitationinfo:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.btitle=Advances in Thin Films, Nanostructured Materials, and Coatings&rft.spage=277&rft.date=2019
dc.identifier.startpage277
dc.identifier.endpage285
dc.identifier.pagecount386
dc.identifier.doihttps://doi.org/10.1007/978-981-13-6133-3_27
dc.identifier.urnURN:NBN:no-76929
dc.type.documentBokkapittelen_US
dc.type.peerreviewedPeer reviewed
dc.source.isbn978-981-13-6132-6
dc.identifier.fulltextFulltext https://www.duo.uio.no/bitstream/handle/10852/73899/1/Pairs.pdf
dc.type.versionAcceptedVersion
cristin.btitleAdvances in Thin Films, Nanostructured Materials, and Coatings


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