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dc.date.accessioned2019-05-28T08:49:09Z
dc.date.available2021-12-31T23:45:37Z
dc.date.created2019-01-30T22:13:46Z
dc.date.issued2018
dc.identifier.citationSky, Thomas Neset Johansen, Klaus Magnus H Frodason, Ymir Kalmann Svensson, Bengt Gunnar Vines, Lasse . The interaction between lithium acceptors and gallium donors in zinc oxide. Journal of Applied Physics. 2018, 124(24)
dc.identifier.urihttp://hdl.handle.net/10852/68014
dc.description.abstractDiffusion of lithium (Li) in uniformly gallium (Ga)-doped monocrystalline bulk Zinc Oxide (ZnO) is studied over a wide temperature range (500 − 1150◦C) and is demonstrated to be dictated by the distribution of Ga. Below 800◦C, the indiffusion of Li from a Li-doped ZnO sputtered film into a n + ZnO bulk yields an abrupt and compensated Li-doped box region with the Li concentration matching the free-electron concentration, in accordance with several previous experimental and theoretical reports. However, experimental observations of Li-diffusion at higher temperatures have not previously been reported. In this study we give a detailed description of a dissociative diffusion mechanism for Li up to 1150◦C. By employing a reaction-diffusion model that accounts for the presence of both Li and Ga, a dissociation energy of 4.6 eV with an attempt frequency of 5×1015s −1 is obtained from the experimental Li diffusion data. This is in excellent agreement with theoretical results for the dissociation of (LiZnGaZn) 0 (4.8 eV) into Li+ i and (GaZnVZn) −, and strongly suggest that this neutral and stable acceptor-donor pair prevails in Li- and Ga-doped ZnO.en_US
dc.languageEN
dc.publisherAmerican Institute of Physics (AIP)
dc.titleThe interaction between lithium acceptors and gallium donors in zinc oxideen_US
dc.typeJournal articleen_US
dc.creator.authorSky, Thomas Neset
dc.creator.authorJohansen, Klaus Magnus H
dc.creator.authorFrodason, Ymir Kalmann
dc.creator.authorSvensson, Bengt Gunnar
dc.creator.authorVines, Lasse
cristin.unitcode185,15,4,90
cristin.unitnameHalvlederfysikk
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode1
dc.identifier.cristin1669537
dc.identifier.bibliographiccitationinfo:ofi/fmt:kev:mtx:ctx&ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Journal of Applied Physics&rft.volume=124&rft.spage=&rft.date=2018
dc.identifier.jtitleJournal of Applied Physics
dc.identifier.volume124
dc.identifier.issue24
dc.identifier.doi10.1063/1.5063326
dc.identifier.urnURN:NBN:no-71333
dc.type.documentTidsskriftartikkelen_US
dc.type.peerreviewedPeer reviewed
dc.source.issn0021-8979
dc.identifier.fulltextFulltext https://www.duo.uio.no/bitstream/handle/10852/68014/4/1.5063326.pdf
dc.type.versionPublishedVersion
cristin.articleid245702
dc.relation.projectNFR/221992
dc.relation.projectNFR/245963
dc.relation.projectNFR/151131
dc.relation.projectNFR/239895


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