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Nanoscale n(++)-p junction formation in GeOI probed by tip-enhanced Raman spectroscopy and conductive atomic force microscopy

Prucnal, Slawomir; Berencen, Yonder; Wang, Mao; Georgiev, Yordan Nikolaev; Erbe, Artur; Khan, MB; Boettger, Roman; Hübner, Renè; Schoenherr, Tommy; Kalbacova, Jana; Vines, Lasse; Facsko, Stefan; Engler, Martin; Zahn, D. R. T.; Knoch, Joachim; Helm, Manfred; Skorupa, Wolfgang; Zhou, Shengqiang
Journal article; PublishedVersion; Peer reviewed
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1.5080289.pdf (2.567Mb)
Year
2019
Permanent link
http://urn.nb.no/URN:NBN:no-79058

CRIStin
1760389

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  • Fysisk institutt [2348]
  • Det matematisk-naturvitenskapelige fakultet [287]
  • CRIStin høstingsarkiv [15898]
Original version
Journal of Applied Physics. 2019, 125 (24):245703, DOI: https://doi.org/10.1063/1.5080289
Abstract
Ge-on-Si and Ge-on-insulator (GeOI) are the most promising materials for the next-generation nanoelectronics that can be fully integrated with silicon technology. To this day, the fabrication of Ge-based transistors with a n-type channel doping above 5 × 1019 cm−3 remains challenging. Here, we report on n-type doping of Ge beyond the equilibrium solubility limit (ne ≈ 6 × 1020 cm−3) together with a nanoscale technique to inspect the dopant distribution in n++-p junctions in GeOI. The n++ layer in Ge is realized by P+ ion implantation followed by millisecond-flashlamp annealing. The electron concentration is found to be three times higher than the equilibrium solid solubility limit of P in Ge determined at 800 °C. The millisecond-flashlamp annealing process is used for the electrical activation of the implanted P dopant and to fully suppress its diffusion. The study of the P activation and distribution in implanted GeOI relies on the combination of Raman spectroscopy, conductive atomic force microscopy, and secondary ion mass spectrometry. The linear dependence between the Fano asymmetry parameter q and the active carrier concentration makes Raman spectroscopy a powerful tool to study the electrical properties of semiconductors. We also demonstrate the high electrical activation efficiency together with the formation of ohmic contacts through Ni germanidation via a single-step flashlamp annealing process.
 
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