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(Journal article / Tidsskriftartikkel / AcceptedVersion; Peer reviewed, 2017)
We demonstrate controlled deposition by atomic layer deposition of YVO4:Yb3+ thin films exhibiting an intense NIR emission under UV excitation after post-deposition annealing at 1000 °C. The samples are deposited using the ...
(Journal article / Tidsskriftartikkel / AcceptedVersion; Peer reviewed, 2017)
UV to visible and near-infrared converting thin films of YbVO4 have been deposited by atomic layer deposition, using the precursor combinations Yb(thd)3 (thd = 2,2,6,6-tetramethyl-3,5-heptanedione) and O3, and VO(thd)2 and ...